We are pleased to announce the installation of our production-grade Evatech Sputtering System CLN200E sputtering system in the Koohi Research Group. This state-of-the-art deposition platform expands our thin-film fabrication capabilities for advanced MEMS and microelectronic device development.
The Evatec CLN200E system provides high-uniformity film deposition for III-Nitride, enabling research into next-generation ferroelectric, piezoelectric, and tunable RF devices. The system’s advanced automation and precision process control support both research-scale and pre-production thin-film engineering.
Key System Features
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8-inch substrate capability with heated chuck up to 500 °C.
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Multi-gas compatibility: Ar, N₂, and O₂.
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Dual target shutters and substrate shutter for flexible co-sputtering configurations.
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Single-wafer load lock with automated wafer handling and manipulation.
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Fully automated operation with graphical user interface, process editor, and recipe management system.
This new tool will play a central role in exploring ferroelectric materials and supporting projects aimed at developing high-performance MEMS resonators, acoustic filters, and tunable RF front-end components.